Shirt With Applique Back

100% poly. Dry clean only. Hidden front button placket. Back ruffle accent. Bell sleeves with button closures. Side seam slits. EDIR-WS10. T005. Launched in 2014, EDIT encapsulates the unique perspectives of its designers - one part eclectic femininity and one part calm effortlessness. Originating from Hong Kong, the brand is a collection full of informal strategic wardrobe items that can be styled in a multitude of ways.